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VPD/MS Sampling

Interlab’s FlashScan® sample preparation systems offer unprecedented repeatability and control in wafer contamination analysis. The system delivers precisely controlled sample gathering of contaminants in the native oxide layer, ready for analysis by ICP-MS, TXRF, or other means. In addition to sample preparation scanners, the newest generation of fully automated FlashScan® includes a highly sophisticated mass spectrometer within its own mini-environment, delivering usable (“pre-interpreted”) contamination data with no operator involvement.

Patented vapor phase decomposition (VPD) of the surface oxide layer is performed using the innovative “flash” technique, which is faster, safer, and uses a fraction of the HF required by the conventional HF evaporation  method. Subsequent precision controlled scanning is fully-programmable, allowing safe, accurate sampling of the entire wafer surface, or any selected portion, including “edge exclusion”. Fully automated versions can address FOUP handling, delivering finished reusable wafers, and immediate analytical information.